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Nitrogen Trifluoride Semiconductor Process Materials

Efficient LCD Display Panel Cleaner Nitrogen Trifluoride

Unit Price: USD 9999 / Ton

Min.Order Unit Price
100 Ton USD 9999 / Ton

Product introduction Nitrogen trifluoride (NF3) is a kind of colorless, odorless and character stable gas, it is also a kind of strong oxidant. Its melting point is 206.8 ℃, boiling point is 129.0 ℃, insoluble in water. Nitrogen trifluoride in the...

China Nitrogen Trifluoride Semiconductor Process Materials Suppliers

Nitrogen Trifluoride in the microelectronics industry is a kind of excellent plasma etching gas, which is cracked into active fluorine ion during the process of plasma etching. For the plasma etching of silicon and silicon nitride, using nitrogen trifluoride has higher etching rate and selectivity than using of Carbon Tetrafluoride or carbon tetrafluoride and oxygen mixed gas, especially in the process of etching integrated circuit material with the thickness of less than 1.5 μm, nitrogen trifluoride has excellent etching rate and selectivity, what's more, there is no pollution on the surface of etched material, it is also a good cleaning agent.
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