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Shandong Zhongshan Photoelectric Materials Co., Ltd

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HomeProductsSemiconductor Process MaterialsNitrogen TrifluorideEfficient LCD Display Panel Cleaner Nitrogen Trifluoride

Efficient LCD Display Panel Cleaner Nitrogen Trifluoride

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Product Attributes

Model No.Nitrogen Trifluoride

Product introduction

Nitrogen Trifluoride (NF3) is a kind of colorless, odorless and character stable gas, it is also a kind of strong oxidant. Its melting point is 206.8 ℃, boiling point is 129.0 ℃, insoluble in water. Nitrogen trifluoride in the microelectronics industry is a kind of excellent plasma etching gas, which is cracked into active fluorine ion during the process of plasma etching. For the plasma etching of silicon and silicon nitride, using nitrogen trifluoride has higher etching rate and selectivity than using of Carbon Tetrafluoride or carbon tetrafluoride and oxygen mixed gas, especially in the process of etching integrated circuit material with the thickness of less than 1.5 μm, nitrogen trifluoride has excellent etching rate and selectivity, what's more, there is no pollution on the surface of etched material, it is also a good cleaning agent.

Quality specification

Items Unit Indexs
(NF3)≥ Vol.% 99.5 99.9 99.98 99.99 99.996
(CF4)≤ Vol.ppm 1500 500 100 50 20
(N2)≤ Vol.ppm 700 50 10 10 5
(O2+Ar))≤ Vol.ppm 700 50 10 5 3
(CO)≤ Vol.ppm 50 10 10 5 1
(CO2)≤ Vol.ppm 25 10 10 5 0.5
(N2O)≤ Vol.ppm 50 10 10 5 1
(SF6)≤ Vol.ppm 50 50 10 5 2
Hydrolyzable fluoride
(Measured by HF)≤
Vol.ppm 1 1 1 1 1
(H2O)≤ Vol.ppm 1 1 1 1 1

Nitrogen trifluoride can be used as fluorine source of high energy chemical laser gas and as etching agent for semiconductor materials such as polysilicon, silicon nitride and tungsten silicide. It can also be used as a cleaning agent for chemical vapor deposition chamber and LCD panel. Nitrogen trifluoride is used as a cleaning agent for CVD box, which can reduce pollutant emission by 90% compared with perfluorocarbons, and significantly improve the cleaning speed and cleaning capacity.

Packaging and storage

Nitrogen trifluoride is filled in a steel seamless cylinder with the volume of 8L, 40L, 43.3L and 47L, respectively. The pressure of cylinder is 9.0-13.0MPa. Packaging specifications can be customized according to customers' requirements.

Looking for ideal Chemical Cleaning Agent Manufacturer & supplier ? We have a wide selection at great prices to help you get creative. All the Liquid Crystal Display Panel Cleaning Agent are quality guaranteed. We are China Origin Factory of Fluorine Of High-energy Chemical Laser Gas. If you have any question, please feel free to contact us.

Product Categories : Semiconductor Process Materials > Nitrogen Trifluoride

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